Surface cleaning and etching of CdZnTe and CdTe in H 2 /Ar, CH 4 /H 2 /Ar, and CH 4 /H 2 /N 2 /Ar electron cyclotron resonance plasmas

Author： Keller Robert Zimmermann H. Seelmann-Eggebert M. Richter H.

Publisher： Springer Publishing Company

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.26, Iss.6, 1997-06, pp. : 542-551

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