Chemical-Mechanical polishing of parylene- n films: evaluation by X-Ray photoelectron spectroscopy and atomic force microscopy

Author: Yang G.   Zhao Y.   Neirynck Jan   Murarka Shyam   Gutmann Ronald  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.26, Iss.8, 1997-08, pp. : 935-940

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