Monte Carlo simulation studies of sidewall roughening during reactive ion etching

Author： Pani S.K. Tjiptoharsono F. Wong C.C. Premachandran C.S. Ramama P.V. Iyer M.K.

ISSN： 0947-8396

Source： Applied Physics A, Vol.88, Iss.2, 2007-08, pp. : 401-407

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