(Ba,Sr)TiO 3 thin film growth in a batch processing MOCVD reactor

Author: Regnery S.   Ehrhart P.   Fitsilis F.   Waser R.   Ding Y.   Jia C.L.   Schumacher M.   Schienle F.   Juergensen H.  

Publisher: Elsevier

ISSN: 0955-2219

Source: Journal of the European Ceramic Society, Vol.24, Iss.2, 2004-01, pp. : 271-276

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Abstract