Whole wafer magnetostriction metrology for magnetic films and multilayers

Author: Hill C.B.   Hendren W.R.   Bowman R.M.   McGeehin P.K.   Gubbins M.A.   Venugopal V.A.  

Publisher: IOP Publishing

ISSN: 0957-0233

Source: Measurement Science and Technology, Vol.24, Iss.4, 2013-04, pp. : 45601-45606

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Abstract