Measurement of the dopant concentration in a semiconductor using the Seebeck effect

Author： Pó J.M.   Brito M.C.   Alves J Maia   Silva J.A.   Serra J.M.   Vallêra A.M.  

Publisher： IOP Publishing

ISSN： 0957-0233

Source： Measurement Science and Technology, Vol.24, Iss.5, 2013-05, pp. : 55601-55606

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