A new fabrication method for vanadium dioxide thin films deposited by ion beam sputtering

Author: Yi X.   Chen C.   Liu L.   Wang Y.   Xiong B.   Wang H.   Chen S.  

Publisher: Elsevier

ISSN: 1350-4495

Source: Infrared Physics and Technology, Vol.44, Iss.2, 2003-04, pp. : 137-141

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Abstract