Influence of high-field electron injection regimes on modification of dielectric films of MOS devices

Author： Andreev V.   Bondarenko G.   Stolyarov A.   Vasyutin D.   Mikhal'kov A.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 2075-1133

Source： Inorganic Materials: Applied Research, Vol.1, Iss.2, 2010-04, pp. : 105-109

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