Period of time： 2013年1期
Publisher： Springer Publishing Company
Founded in： 1981
Total resources： 29
ISSN： 0272-4324
Subject： O6 Chemistry
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Plasma Chemistry and Plasma Processing,volume 31,issue 1
Menu
By Hung C.-T.,Chiu Y.-M.,Hwang F.-N.,Chiang M.-H.,Wu J.-S.,Wang Y.-C. in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.
Access to resources
Recommend
By Lyulyukin Mikhail,Besov Alexey,Vorontsov Alexander in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.Understanding OH Yields in Electron Beam Irradiation of Humid N2
By Schmitt Karen,Dibble Theodore in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.Mechanism of Calcium Ion Precipitation from Hard Water Using Pulsed Spark Discharges
By Yang Yong,Kim Hyoungsup,Starikovskiy Andrey,Cho Young,Fridman Alexander in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.Direct Oxidation of Methane to Methanol Over Cu-Based Catalyst in an AC Dielectric Barrier Discharge
By Huang Liang,Zhang Xing-wang,Chen Lin,Lei Le-cheng in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.Efficiency of CO2 Dissociation in a Radio-Frequency Discharge
By Spencer Laura,Gallimore Alec in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.New Process Simulation Procedure for High-Rate Plasma Jet Machining
By Meister Johannes,Arnold Thomas in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.By Ghiloufi Imed,Girold Christophe in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.Direct Measurement of the Gas Entrainment Into a Turbulent Thermal Plasma Jet
By Wang Hai-Xing,Wei Fu-Zhi,Meng Xian,Chen Xi,Han Dong-Sheng,Pan Wen in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.By Twomey B.,Nindrayog A.,Niemi K.,Graham W.,Dowling D. in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 1 , Vol. 31, Iss. 1, 2011-02 , pp.
Previous
Next