Period of time: 2013年4期
Publisher: Springer Publishing Company
Founded in: 1981
Total resources: 29
ISSN: 0272-4324
Subject: O6 Chemistry
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Plasma Chemistry and Plasma Processing,volume 31,issue 4
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By Rueangjitt Nongnuch in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 4 , Vol. 31, Iss. 4, 2011-08 , pp.By Girard-Lauriault Pierre-Luc in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 4 , Vol. 31, Iss. 4, 2011-08 , pp.By Wettmarshausen S. in (2011)
Plasma Chemistry and Plasma Processing,volume 31,issue 4 , Vol. 31, Iss. 4, 2011-08 , pp.Application of Dielectric Barrier Discharge for Waste Water Purification
Plasma Chemistry and Plasma Processing,volume 31,issue 4 , Vol. 31, Iss. 4, 2011-08 , pp.Characterization and Wear Behavior of Plasma Nitrided Nickel Based Dental Alloy
Plasma Chemistry and Plasma Processing,volume 31,issue 4 , Vol. 31, Iss. 4, 2011-08 , pp.