Application of Nomarski interference contrast microscopy as a thickness monitor in the preparation of transparent, SiC-based, cross-sectional TEM samples

Author： Preble E.A.   McLean H.A.   Kiesel S.M.   Miraglia P.   Albrecht M.   Davis R.F.  

Publisher： Elsevier

ISSN： 0304-3991

Source： Ultramicroscopy, Vol.92, Iss.3, 2002-08, pp. : 265-271

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Preparation of TEM plan-view and cross-sectional specimens of ZnSeGaAs epilayers by chemical thinning and argon ion milling

By N. W.   K. K.F.  

Ultramicroscopy, Vol. 60, Iss. 3, 1995-10 ,pp. : 427-435

Elsevier

Access to resources Recommend Favorite

Cross-sectional atomic force microscopy imaging of polycrystalline thin films

By Ballif C.   Moutinho H.R.   Hasoon F.S.   Dhere R.G.   Al-Jassim M.M.  

Ultramicroscopy, Vol. 85, Iss. 2, 2000-10 ,pp. : 61-71

Elsevier

Access to resources Recommend Favorite

The concept of high angle wedge polishing and thickness monitoring in TEM sample preparation

By Li H.   Salamanca-Riba L.  

Ultramicroscopy, Vol. 88, Iss. 3, 2001-08 ,pp. : 171-178

Elsevier

Access to resources Recommend Favorite

Optimisation of the wire-shadow TEM cross-section preparation technique

By Senz S.   Kopperschmidt P.   Langer E.   Sieber H.   Hesse D.  

Ultramicroscopy, Vol. 70, Iss. 1, 1997-12 ,pp. : 23-28

Elsevier

Access to resources Recommend Favorite

Differential phase contrast in TEM

By McCartney M.R.   Kruit P.   Buist A.H.   Scheinfein M.R.  

Ultramicroscopy, Vol. 65, Iss. 3, 1996-10 ,pp. : 179-186

Elsevier

Access to resources Recommend Favorite