SURFACE INTEGRITY AND REMOVAL RATE OF SILICON SPUTTERED WITH FOCUSED ION BEAM

Author： Hung N.   Ali M.   Fu Y.   Ong N.   Tay M.  

Publisher： Taylor & Francis Ltd

ISSN： 1091-0344

Source： Machining Science and Technology, Vol.5, Iss.2, 2001-01, pp. : 239-254

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Nanosteps Preparation Based on Focused Ion Beam Technique

By  

Applied Mechanics and Materials, Vol. 2017, Iss. 870, 2017-10 ,pp. : 114-119

Trans Tech Publications

Access to resources Recommend Favorite

Focused ion beam-shaped microtools for ultra-precision machining of cylindrical components

By Picard Y.N.   Adams D.P.   Vasile M.J.   Ritchey M.B.  

Precision Engineering, Vol. 27, Iss. 1, 2003-01 ,pp. : 59-69

Elsevier

Access to resources Recommend Favorite

The Adhesion of Monomolecular Hydroxyl-terminated Perfluoropolyether Liquid Films on the Sputtered Silicon Nitride Surface as a Function of End Group Acidity and Mobility

By Waltman R.  

Tribology Letters, Vol. 20, Iss. 1, 2005-09 ,pp. : 69-81

Springer Publishing Company

Access to resources Recommend Favorite

Formation of High Aspect Ratio Nanostructures Using Focused Ion Beam Induced Deposition of Carbon

By  

Applied Mechanics and Materials, Vol. 2015, Iss. 752, 2015-05 ,pp. : 154-158

Trans Tech Publications

Access to resources Recommend Favorite

Effects of the Profile of Workpiece Surface on Material Removal Rate Distribution in Polishing Process

By  

Applied Mechanics and Materials, Vol. 2016, Iss. 851, 2016-10 ,pp. : 149-154

Trans Tech Publications

Access to resources Recommend Favorite