Characteristics of SrTiO 3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures

Author： Wang Zhongchun Kugler Veronika Helmersson Ulf Evangelou E. K. Konofaos N. Nakao Setsuo Jin Ping

ISSN： 1463-6417

Source： Philosophical Magazine B, Vol.82, Iss.8, 2002-05, pp. : 891-903

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Characteristics of BaTiO3 thin films on Si deposited by rf magnetron sputtering

By Jia Q. X. Smith J. L. Chang L. H. Anderson W. A.

Philosophical Magazine B, Vol. 77, Iss. 1, 1998-01 ,pp. : 163-175

Taylor & Francis Ltd

Access to resources Recommend Favorite

Preparation of SrTiO 3 Films on sapphire substrate by RF magnetron sputtering

By Loginov V.E. Hollmann E.K. Kozyrev A.B. Prudan A.M.

Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. : 141-143

Elsevier

Access to resources Recommend Favorite

The thickness dependence of (Ba 0.5 Sr 0.5 )TiO 3 thin films deposited on indium tin oxide-coated glass substrate using r.f. magnetron sputtering

By Kim T.S. Oh M.H. Kim C.H.

Thin Solid Films, Vol. 254, Iss. 1, 1995-01 ,pp. : 273-277

Elsevier

Access to resources Recommend Favorite

Dielectric and leakage current characteristics of Ba(Ti 1-x Zr x )O 3 thin films deposited by rf magnetron sputtering

By Wu T.-B. Wu C.-M. Chen M.-L.

Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. : 77-81

Elsevier

Access to resources Recommend Favorite

Characteristics of ZnO thin films deposited onto Al/Si substrates by r.f. magnetron sputtering

By Ki H.Y. Choi J.-W. Lee D.-H.

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 116-121

Elsevier

Access to resources Recommend Favorite