Adhesion of silver films to ion-bombarded silicon carbide: ion-dose dependence and Weibull statistical analysis of pull-test results

By Erck R.A.  

Journal of Adhesion Science and Technology, Vol. 8, Iss. 8, 1994-01 ,pp. : 885-895

Taylor & Francis Ltd

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Adhesion enhancement of magnetron-sputtered copper films by ion bombardment etching treatment of nickel and Inconel substrates: investigations by Auger electron spectroscopy and secondary ion mass spectroscopy of the ion beam effects

By Cahoreau M.  

Journal of Adhesion Science and Technology, Vol. 5, Iss. 11, 1991-01 ,pp. : 987-999

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Adhesion studies of radio-frequency sputtered SiO2 films on Ti, stainless steel, Ni and Inconel substrates. Effects of substrate surface ion bombardment etching

By Lee G.H.  

Journal of Adhesion Science and Technology, Vol. 4, Iss. 1, 1990-01 ,pp. : 481-501

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Testing of adhesion of thin films to substrates

By Pawel J.E.   McHargue C.J.  

Journal of Adhesion Science and Technology, Vol. 2, Iss. 1, 1988-01 ,pp. : 369-383

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Adhesion measurement of thin metal films by scratch, peel, and pull methods

By Kinbara Akira  

Journal of Adhesion Science and Technology, Vol. 7, Iss. 8, 1993-01 ,pp. : 767-782

Taylor & Francis Ltd

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