Self-assembled monolayer resists and nanoscale lithography of silicon dioxide thin films by chemically enhanced vapor etching (CEVE)

Author： Pan M.   Yun M.   Kozicki M.N.   Whidden T.K.  

Publisher： Academic Press

ISSN： 0749-6036

Source： Superlattices and Microstructures, Vol.20, Iss.3, 1996-10, pp. : 369-376

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