Growth of In 0.52 Al 0.48 As on InP substrates by molecular beam epitaxy: some effects of V/III flux ratio variation

Author: Yoon S.F.  

Publisher: Academic Press

ISSN: 0749-6036

Source: Superlattices and Microstructures, Vol.23, Iss.2, 1998-02, pp. : 535-542

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract