Crystallographic orientation contrast associated with Ga + ion channelling for Fe and Cu in focused ion beam method

By Yahiro Y.   Kaneko K.   Fujita T.   Moon W.-J.   Horita Z.  

Journal of Electron Microscopy, Vol. 53, Iss. 5, 2004-10 ,pp. : 571-576

Oxford University Press

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In Situ Microlithography of Si and GaAs by a Focused Ion Beam in a 200 keV TEM

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Journal of Electron Microscopy, Vol. 45, Iss. 4, 1996-08 ,pp. : 291-297

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Characterization of charging in semiconductor device materials by electron holography

By McCartney Martha R.  

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Heavy ion irradiation induces autophagy in irradiated C2C12 myoblasts and their bystander cells

By Hino Mizuki   Hamada Nobuyuki   Tajika Yuki   Funayama Tomoo   Morimura Yoshihiro   Sakashita Tetsuya   Yokota Yuichiro   Fukamoto Kana   Mutou Yasuko   Kobayashi Yasuhiko   Yorifuji Hiroshi  

Journal of Electron Microscopy, Vol. 59, Iss. 6, 2010-12 ,pp. : 495-501

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High-resolution transmission electron microscopy and electron energy-loss spectroscopy study of polycrystalline-Si/ZrO 2 /SiO 2 /Si metal-oxide-semiconductor structures

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Journal of Electron Microscopy, Vol. 55, Iss. 1, 2006-01 ,pp. : 1-5

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