Photochemical etching technique for preparing high-quality TEM samples of n-type compound semiconductors

By Hibino M.  

Journal of Electron Microscopy, Vol. 46, Iss. 2, 1997-01 ,pp. : 129-133

Oxford University Press

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A study of the damage on FIB-prepared TEM samples of Al x Ga 1−x As

By Yabuuchi Yasufumi  

Journal of Electron Microscopy, Vol. 53, Iss. 5, 2004-10 ,pp. : 471-477

Oxford University Press

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Preparation of TEM plane view sections on semiconductor device using the tripod-polisher and chemical etching

By Kato N.  

Journal of Electron Microscopy, Vol. 50, Iss. 1, 2001-02 ,pp. : 9-13

Oxford University Press

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Focused ion beam preparation techniques dedicated for the fabrication of TEM lamellae of fibre-reinforced composites

By Mucha Herbert  

Journal of Electron Microscopy, Vol. 54, Iss. 1, 2005-01 ,pp. : 43-49

Oxford University Press

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Comparison of TEM specimen preparation of perovskite thin films by tripod polishing and conventional ion milling

By Eberg Espen   Monsen smund F.   Tybell Thomas   van Helvoort Antonius T. J.   Holmestad Randi  

Journal of Electron Microscopy, Vol. 57, Iss. 6, 2008-12 ,pp. : 175-179

Oxford University Press

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