A Critical Comparison of Ar and Ar-N₂ Inductively Coupled Plasmas as Excitation Sources for Atomic Emission Spectrometry

Author： Montaser Akbar Fassel V. A. Zalewski J.

Publisher： Society for Applied Spectroscopy

ISSN： 0003-7028

Source： Applied Spectroscopy, Vol.35, Iss.3, 1981-05, pp. : 292-302

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Prominent Spectral Lines for Analytical Atomic Emission Spectrometry with an Ar-N₂ Inductively Coupled Plasma

By Montaser Akbar Chan Shi-Kit Huse G. R. Vieira P. A. Van Hoven R. L.

Applied Spectroscopy, Vol. 40, Iss. 4, 1986-05 ,pp. : 473-477

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Electron Number Density Measurements in Ar and Ar-N₂ Inductively Coupled Plasmas

By Montaser Akbar Fassel Velmer A.

Applied Spectroscopy, Vol. 36, Iss. 6, 1982-11 ,pp. : 613-617

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Atomic Emission Spectrometry with a Skimmed Inductively Coupled AR Plasma

By Montaser Akbar Fassel V. A.

Applied Spectroscopy, Vol. 36, Iss. 4, 1982-07 ,pp. : 454-459

Society for Applied Spectroscopy

Access to resources Recommend Favorite

In-Flight Spheroidization of Alumina Powders in Ar–H₂ and Ar–N₂ Induction Plasmas

By Ye R. Ishigaki T. Jurewicz J. Proulx P. Boulos M.

Plasma Chemistry and Plasma Processing, Vol. 24, Iss. 4, 2004-12 ,pp. : 555-571

Springer Publishing Company

Access to resources Recommend Favorite

Preconcentration and determination of trace elements with 2-aminoacetylthiophenol functionalized Amberlite XAD-2 by inductively coupled plasma-atomic emission spectrometry

By Guo Y. Din B. Liu Y. Chang X. Meng S. Liu J.

Talanta, Vol. 62, Iss. 1, 2004-01 ,pp. : 207-213

Elsevier

Access to resources Recommend Favorite