A Critical Comparison of Ar and Ar-N₂ Inductively Coupled Plasmas as Excitation Sources for Atomic Emission Spectrometry

By Montaser Akbar   Fassel V. A.   Zalewski J.  

Applied Spectroscopy, Vol. 35, Iss. 3, 1981-05 ,pp. : 292-302

Society for Applied Spectroscopy

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Prominent Spectral Lines for Analytical Atomic Emission Spectrometry with an Ar-N₂ Inductively Coupled Plasma

By Montaser Akbar   Chan Shi-Kit   Huse G. R.   Vieira P. A.   Van Hoven R. L.  

Applied Spectroscopy, Vol. 40, Iss. 4, 1986-05 ,pp. : 473-477

Society for Applied Spectroscopy

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In-Flight Spheroidization of Alumina Powders in Ar–H₂ and Ar–N₂ Induction Plasmas

By Ye R.   Ishigaki T.   Jurewicz J.   Proulx P.   Boulos M.  

Plasma Chemistry and Plasma Processing, Vol. 24, Iss. 4, 2004-12 ,pp. : 555-571

Springer Publishing Company

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Etching Characteristics and Mechanisms of Mo and Al 2 O 3 Thin Films in O 2 /Cl 2 /Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios

By Kang Sungchil  

Plasma Chemistry and Plasma Processing, Vol. 33, Iss. 2, 2013-04 ,pp. : 527-538

Springer Publishing Company

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Electron Number Densities in Analytical Inductively Coupled Plasmas as Determined via Series Limit Line Merging

By Montaser Akbar   Fassel V. A.   Larsen G.  

Applied Spectroscopy, Vol. 35, Iss. 4, 1981-07 ,pp. : 385-389

Society for Applied Spectroscopy

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