Analysis of depth profile for impurity concentration in Si wafer by synchrotron radiation excited total reflection X-ray fluorescence spectroscopy

By Huh B.-K.   Kim J.-S.   Shin N.-S.   Koo Y.-M.   Chung H.-Y.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 8, 2003-08 ,pp. : 1445-1452

Elsevier

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Comparison of conventional and total reflection excitation geometry for fluorescence X-ray absorption spectroscopy on droplet samples

By Falkenberg G.   Pepponi G.   Streli C.   Wobrauschek P.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2239-2244

Elsevier

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Elemental content in deionized water by total-reflection X-ray fluorescence spectrometry

By Tavares G.   Almeida E.   Oliveira J.   Bendassolli J.   Nascimento Filho V.  

Journal of Radioanalytical and Nuclear Chemistry, Vol. 287, Iss. 2, 2011-02 ,pp. : 377-381

Springer Publishing Company

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Development of vapor phase decomposition-total-reflection X-ray fluorescence spectrometer

By Yamagami M.   Ikeshita A.   Onizuka Y.   Kojima S.   Yamada T.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2079-2084

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The use of a portable total reflection X-ray fluorescence spectrometer for field investigation

By Mages M.   Woelfl S.   Ovari M.   Tumpling jun W.v.  

Spectrochimica Acta Part B: Atomic Spectroscopy, Vol. 58, Iss. 12, 2003-12 ,pp. : 2129-2138

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