Molecular Composition and Orientation of Interstitial versus Surface Silicon Oxides for Si(111)/SiO2 and Si(100)/SiO2 Interfaces using FT-IR and X-ray Photoelectron Spectroscopies

Author: Kandilioti Georgia   Siokou Angeliki   Papaefthimiou Vasiliki   Kennou Stella   Gregoriou Vasilis G.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.57, Iss.6, 2003-06, pp. : 628-635

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