Metalorganic Chemical Vapor Deposition of Oxide Films on Semiconductor Substrates Using Aluminum, Gallium, and Indium Alkyl Chloride Precursors

Author: Mittov O.N.   Ponomareva N.I.   Mittova I.Y.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0020-1685

Source: Inorganic Materials, Vol.38, Iss.5, 2002-05, pp. : 438-444

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content