Chemical Vapor Deposition of Copper Films from Copper Dipivaloylmethanate in Hydrogen Atmosphere

Author: Bakovets V.V.   Levashova T.M.   Dolgovesova I.P.   Danilovich V.S.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0020-1685

Source: Inorganic Materials, Vol.38, Iss.5, 2002-05, pp. : 457-463

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