Mechanism of copper chemical vapor deposition from copper dipivaloylmethanate in hydrogen

Author: Bakovets V.   Levashova T.   Dolgovesova I.   Maksimovskii E.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0020-1685

Source: Inorganic Materials, Vol.41, Iss.1, 2005-01, pp. : 19-23

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