Structure and properties of films grown on Si, Ta, Ti, Mo, W, and Ni substrates by reactive ion-beam sputtering

Author： Ignatenko P.   Klyakhina N.   Badekin M.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 0020-1685

Source： Inorganic Materials, Vol.41, Iss.2, 2005-02, pp. : 148-151

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere

By Ignatenko P.   Badekin M.  

Inorganic Materials, Vol. 41, Iss. 3, 2005-03 ,pp. : 243-246

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Thermoelectric Properties and Morphology of Si/SiC Thin-Film Multilayers Grown by Ion Beam Sputtering

By Cramer Corson L.   Farnell Casey C.   Farnell Cody C.   Geiss Roy H.   Williams John D.  

Coatings, Vol. 8, Iss. 3, 2018-03 ,pp. : 109-109

MDPI

Access to resources Recommend Favorite

Reactive diffusion in W–Mo–Si thin films

By Derafa A.   Record M.-C.   Mangelinck D.   Halimi R.   Bouabellou A.  

Journal of Thermal Analysis and Calorimetry, Vol. 103, Iss. 1, 2011-01 ,pp. : 111-116

Springer Publishing Company

Access to resources Recommend Favorite

Properties of ITO films prepared by reactive magnetron sputtering

By Kleinhempel Ronny   Kaune Gunar   Herrmann Matthias   Kupfer Hartmut   Hoyer Walter   Richter Frank  

Microchimica Acta, Vol. 156, Iss. 1-2, 2006-11 ,pp. : 61-67

Springer Publishing Company

Access to resources Recommend Favorite