Fabrication of Strain-Relaxed Si1 − x Gex/Si(001) Buffer Layers of Low Surface Roughness

Author: Vostokov N.   Drozdov Yu.   Krasil’nik Z.   Kuznetsov O.   Novikov A.   Perevoshchikov V.   Shaleev M.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7397

Source: Russian Microelectronics, Vol.34, Iss.4, 2005-07, pp. : 203-209

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content