A system for precision reactive ion-beam etching of nanostructures for field-emission devices

Author： Maishev Yu.   Terent’ev Yu.   Shevchuk S.   Tatarenko N.   Golikov V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.39, Iss.4, 2010-07, pp. : 252-261

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