Industrial Application of Pulsed Dc Bias Power Supplies in Closed Field Unbalanced Magnetron Sputter Ion Plating

Author： Cooke K.E.   Hampshire J.   Southall W.   Teer D.G.  

Publisher： Maney Publishing

ISSN： 1743-2944

Source： Surface Engineering, Vol.20, Iss.3, 2004-06, pp. : 189-195

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