Deposition of Iridium Thin Films on Three‐Dimensional Structures With PE‐MOCVD

By  

CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol. 21, Iss. 1-2-3, 2015-03 ,pp. : 46-53

John Wiley & Sons Inc

Access to resources Recommend Favorite

Pure and doped CeO 2 thin films prepared by MOCVD process

By Pan M.   Meng G.Y.   Xin H.W.   Chen C.S.   Peng D.K.   Lin Y.S.  

Thin Solid Films, Vol. 324, Iss. 1, 1998-07 ,pp. : 89-93

Elsevier

Access to resources Recommend Favorite

Comparison of deposition behavior of Pb(Zr,Ti)O 3 films and its end-member-oxide films prepared by MOCVD

By Funakubo H.   Nagashima K.   Shinozaki K.   Mizutani N.  

Thin Solid Films, Vol. 368, Iss. 2, 2000-06 ,pp. : 261-265

Elsevier

Access to resources Recommend Favorite

Relations between structural and electronic properties of SnO 2 polycrystalline thin films prepared by the aerosol MOCVD technique

By Ivashchenco A.I.   Karyaev E.V.   Khoroshun I.V.   Kiosse G.A.   Moshnyaga V.T.   Petrenco P.A.  

Thin Solid Films, Vol. 263, Iss. 1, 1995-07 ,pp. : 122-126

Elsevier

Access to resources Recommend Favorite

Characteristics of c-axis oriented large grain ZnO films prepared by low-pressure MO-CVD method

By Kashiwaba Y.   Sugawara K.   Haga K.   Watanabe H.   Zhang B.P.   Segawa Y.  

Thin Solid Films, Vol. 411, Iss. 1, 2002-05 ,pp. : 87-90

Elsevier

Access to resources Recommend Favorite