Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering

Author： Lei Zhang Zhi-Jiang He Chao-Zhuo Liu Xu-Fei Wang Li-Qun Shi

ISSN： 0256-307X

Source： Chinese Physics Letters, Vol.29, Iss.1, 2012-01, pp. : 12501-12504

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