AlGaN/GaN Metal-Insulator-Semiconductor High Electron-Mobility Transistor Using a NbAlO/Al2O3 Laminated Dielectric by Atomic Layer Deposition

Author: Zhi-Wei Bi   Yue Hao   Qian Feng   Zhi-Yuan Gao   Jin-Cheng Zhang   Wei Mao   Kai Zhang   Xiao-Hua Ma   Hong-Xia Liu   Lin-An Yang   Nan Mei   Yong-Ming Chang  

Publisher: IOP Publishing

ISSN: 0256-307X

Source: Chinese Physics Letters, Vol.29, Iss.2, 2012-02, pp. : 28501-28504

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content