Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

By Liu Zuwei   Gu Xiaodan   Hwu Justin   Sassolini Simone   Olynick Deirdre L  

Nanotechnology, Vol. 25, Iss. 28, 2014-07 ,pp. : 285301-285308

IOP Publishing

Access to resources Recommend Favorite

Self-formation of sub-10 nm nanogaps based on silicidation

By Tang Xiaohui   Francis Laurent A     Reckinger Nicolas   Raskin Jean-Pierre  

Nanotechnology, Vol. 25, Iss. 11, 2014-03 ,pp. : 115201-115209

IOP Publishing

Access to resources Recommend Favorite

Templated deposition of multiscale periodic metallic nanodot arrays with sub-10 nm gaps on rigid and flexible substrates

By Yu Dongliang   Huang Hongtao   Lu Linfeng   Che Jianfei   Chen Xiaoyuan   Zhu Xufei   Song Ye   Li Dongdong  

Nanotechnology, Vol. 25, Iss. 46, 2014-11 ,pp. : 465303-465310

IOP Publishing

Access to resources Recommend Favorite

General fabrication of ordered nanocone arrays by one-step selective plasma etching

By Wang Qiang   Tian Zhaoshuo   Li Yunlong   Tian Shibing   Li Yunming   Ren Shoutian   Gu Changzhi   Li Junjie  

Nanotechnology, Vol. 25, Iss. 11, 2014-03 ,pp. : 115301-115310

IOP Publishing

Access to resources Recommend Favorite

Porous Silicon Antireflection Coating for Solar Cells Using Chemical Etching in HF-FeCl₃-H₂O

By  

International Journal of Engineering Research in Africa, Vol. 2016, Iss. 22, 2016-03 ,pp. : 1-6

Trans Tech Publications

Access to resources Recommend Favorite