Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

Author： Liu Zuwei   Gu Xiaodan   Hwu Justin   Sassolini Simone   Olynick Deirdre L  

Publisher： IOP Publishing

ISSN： 0957-4484

Source： Nanotechnology, Vol.25, Iss.28, 2014-07, pp. : 285301-285308

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