Study of SF6 and SF6/O2 plasmas in a hollow cathode reactive ion etching reactor using Langmuir probe and optical emission spectroscopy techniques

Author: Pessoa R S   Tezani L L   Maciel H S   Petraconi G   Massi M  

Publisher: IOP Publishing

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.19, Iss.2, 2010-04, pp. : 25013-25019

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content