Author： Kozák Tomáš
Publisher： IOP Publishing
ISSN： 0963-0252
Source： Plasma Sources Science and Technology, Vol.21, Iss.2, 2012-04, pp. : 25012-25023
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Access to resources
Recommend
By Yu He Meng Liang Szott Matthew M McLain Jake T Cho Tae S Ruzic David N
Plasma Sources Science and Technology, Vol. 22, Iss. 4, 2013-08 ,pp. :
On reactive high power impulse magnetron sputtering
Plasma Physics and Controlled Fusion, Vol. 58, Iss. 1, 2016-01 ,pp. :
By Aissa K Ait Semmar N Achour A Simon Q Petit A Camus J Boulmer-Leborgne C Djouadi M A
Journal of Physics D: Applied Physics, Vol. 47, Iss. 35, 2014-09 ,pp. :