Adsorption and desorption of toluene on nanoporous TiO2/SiO2 prepared by atomic layer deposition (ALD): influence of TiO2 thin film thickness and humidity

Author： Seo Hyun   Kim Dae   Kim Kwang-Dae   Park Eun   Sim Chae   Kim Young  

Publisher： Springer Publishing Company

ISSN： 0929-5607

Source： Adsorption, Vol.19, Iss.6, 2013-12, pp. : 1181-1187

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