Influence of Si(100) surface pretreatment on the morphology of TiO 2 films grown by atomic layer deposition

Author： Finnie K.S.   Triani G.   Short K.T.   Mitchell D.R.G.   Attard D.J.   Bartlett J.R.   Barbe C.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.440, Iss.1, 2003-09, pp. : 109-116

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