Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering

By Alfonso J.   Buitrago J.   Torres J.   Marco J.   Santos B.  

Journal of Materials Science, Vol. 45, Iss. 20, 2010-10 ,pp. : 5528-5533

Springer Publishing Company

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Erratum to: Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1596-1596

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Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1589-1595

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Effects of Nb doping on microstructure and properties of Bi 4 Ti 3−x Nb x O 12 thin films prepared by magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 23, Iss. 1, 2012-01 ,pp. : 234-237

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Effect of sputtering power on microstructure of dielectric ceramic thin films by RF magnetron sputtering method using (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ as target

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