Photocatalytic degradation rate of oxalic acid on the semiconductive layer of n-TiO2 particles in the batch mode plate reactor Part I: Mass transfer limits

Author: Kulas J.   Roušar I.   Krýsa J.   Jirkovský J.  

Publisher: Springer Publishing Company

ISSN: 0021-891X

Source: Journal of Applied Electrochemistry, Vol.28, Iss.8, 1998-08, pp. : 843-853

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