Photocatalytic degradation rate of oxalic acid on a semiconductive layer of n-TiO2 particles in a batch mode plate photoreactor Part II: Light intensity limit

Author: Krýsa J.   Vodehnal L.   Jirkovský J.  

Publisher: Springer Publishing Company

ISSN: 0021-891X

Source: Journal of Applied Electrochemistry, Vol.29, Iss.4, 1999-04, pp. : 429-435

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