Anisotropic copper etching with monoethanolamine-complexed cupric ion solutions

Author: Shih C-W.   Wang Y-Y.   Wan C-C.  

Publisher: Springer Publishing Company

ISSN: 0021-891X

Source: Journal of Applied Electrochemistry, Vol.33, Iss.5, 2003-05, pp. : 403-410

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Abstract