Author: Norkus E. Vaškelis A. Jačiauskiene J. VaičIuniene J. Gaidamauskas E. Macalady D.
Publisher: Springer Publishing Company
ISSN: 0021-891X
Source: Journal of Applied Electrochemistry, Vol.35, Iss.1, 2005-01, pp. : 41-47
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
The kinetic H/D isotope effect in electroless copper plating. A DEMS study
Electrochimica Acta, Vol. 42, Iss. 3, 1997-01 ,pp. :