Bonding character of the boron-doped C_60 films prepared by radio frequency plasma assisted vapor deposition

By Zou Y.J.   Zhang X.W.   Li Y.L.   Wang B.   Yan H.   Cui J.Z.   Liu L.M.   Da D.A.  

Journal of Materials Science, Vol. 37, Iss. 5, 2002-03 ,pp. : 1043-1047

Springer Publishing Company

Access to resources Recommend Favorite

Deposition of CNx thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

By Gruger H.   Selbmann D.   Wolf E.   Leonhardt A.  

Journal of Materials Science, Vol. 32, Iss. 11, 1997-11 ,pp. : 2849-2853

Springer Publishing Company

Access to resources Recommend Favorite

Crystalline carbon nitride films prepared by microwave plasma chemical vapour deposition

By Jiang Jinchun   Cheng Wenjuan   Zhang Yang   Zhu Hesun   Shen Dezhong  

Journal of Materials Science, Vol. 41, Iss. 13, 2006-07 ,pp. : 4117-4121

Springer Publishing Company

Access to resources Recommend Favorite

The Chemical and Morphological Properties of Boron–Carbon Alloys Grown by Plasma-Enhanced Chemical Vapour Deposition

By Zhang D.   Mcilroy D.N.   O'Brien W.L.   de Stasio G.  

Journal of Materials Science, Vol. 33, Iss. 20, 1998-10 ,pp. : 4911-4915

Springer Publishing Company

Access to resources Recommend Favorite

Synthesis of HDLC films from solid carbon

By Mills R. L.   Sankar J.   Ray P.   Voigt A.   He J.   Dhandapani B.  

Journal of Materials Science, Vol. 39, Iss. 10, 2004-05 ,pp. : 3309-3318

Springer Publishing Company

Access to resources Recommend Favorite