About the possible diminution of the sp3 C presence along with the increase of the nitrogen enclosure in the CNx thin films produced by reactive pulsed laser deposition

Author： György E.   Mihailescu I.N.   Baleva M.   Trifonova E.P.   Abrashev M.   Darakchieva V.   Zocco A.   Perrone A.  

Publisher： Springer Publishing Company

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.36, Iss.8, 2001-04, pp. : 1951-1956

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Copper nitride films produced by reactive pulsed laser deposition

By Soto G.   Diaz J.A.   de la Cruz W.  

Materials Letters, Vol. 57, Iss. 26, 2003-09 ,pp. : 4130-4133

Elsevier

Access to resources Recommend Favorite

Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization

By Valov I.   De Souza R.   Wang C.   Börger A.   Korte C.   Martin M.   Becker K.   Janek J.  

Journal of Materials Science, Vol. 42, Iss. 6, 2007-03 ,pp. : 1931-1941

Springer Publishing Company

Access to resources Recommend Favorite

Structural studies of reactive pulsed laser-deposited CNx films by X-ray photoelectron spectroscopy and infrared absorption

By Ong C.W.   Zhao X.   Tsang Y.C.   Choy C.L.   Chan P.W.  

Journal of Materials Science, Vol. 32, Iss. 9, 1997-09 ,pp. : 2347-2352

Springer Publishing Company

Access to resources Recommend Favorite

Transparent and conducting ZnO films prepared by reactive pulsed laser deposition

By A. Ismail Raid   Rasheed Bassam   Salm Evan   Al-Hadethy Mukram  

Journal of Materials Science: Materials in Electronics, Vol. 18, Iss. 4, 2007-04 ,pp. : 397-400

Springer Publishing Company

Access to resources Recommend Favorite

Photoconductivity and diode effect in Bi rich multiferroic BiFeO3 thin films grown by pulsed-laser deposition

By Ahadi K.   Mahdavi S.   Nemati A.   Kianinia M.  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 7, 2011-07 ,pp. : 815-820

Springer Publishing Company

Access to resources Recommend Favorite