Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure

By Maung Latt K.   Sher-Yi C.   Osipowicz T.   Lee K.   Lee Y.K.  

Journal of Materials Science, Vol. 36, Iss. 23, 2001-12 ,pp. : 5705-5712

Springer Publishing Company

Access to resources Recommend Favorite

Microstructure of ZnO/Cu/TaN/SiO 2 /Si multilayers prepared by sputter deposition

By Wu W-Y.  

Journal of Materials Science Letters, Vol. 22, Iss. 22, 2003-11 ,pp. : 1603-1606

Springer Publishing Company

Access to resources Recommend Favorite

Study on electroplated copper thin film and its interfacial reactions in the EPCu/IMPCu/IMPTaN/SiO2/Si multilayer structure

By Latt K.M.   Lee Y.K.   van Kan J.A.   Mahabai A.A.  

Journal of Materials Science, Vol. 36, Iss. 22, 2001-11 ,pp. : 5475-5480

Springer Publishing Company

Access to resources Recommend Favorite

DLTS study of annihilation of oxidation induced deep-level defects in Ni/SiO 2 / n -Si MOS structures

By Shashank N.  

Bulletin of Materials Science, Vol. 34, Iss. 7, 2011-12 ,pp. : 1627-1631

Springer Publishing Company

Access to resources Recommend Favorite

Antireflecting coating from Ta₂O₅ and SiO₂ multilayer films

By Koc K.   Tepehan F.   Tepehan G.  

Journal of Materials Science, Vol. 40, Iss. 6, 2005-03 ,pp. : 1363-1366

Springer Publishing Company

Access to resources Recommend Favorite