Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited

Author: Martin N.   Lintymer J.   Gavoille J.   Takadoum J.  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.37, Iss.20, 2002-10, pp. : 4327-4332

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Abstract