Author: Hody V. Belmonte T. Pintassilgo C. Poncin-Epaillard F. Czerwiec T. Henrion G. Segui Y. Loureiro J.
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.26, Iss.3, 2006-06, pp. : 251-266
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Abstract
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