Period of time: 2013年3期
Publisher: Springer Publishing Company
Founded in: 1981
Total resources: 29
ISSN: 0272-4324
Subject: O6 Chemistry
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Plasma Chemistry and Plasma Processing,volume 26,issue 3
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The Observation of Plasma Structures in Electrolyte Solution
By Maximov A.,Kuzmicheva L.,Nikiforov A.,Titova J. in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.Comparison of Laminar and Turbulent Thermal Plasma Jet Characteristics—A Modeling Study
By Cheng Kai,Chen Xi,Pan Wenxia in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.Humidity Effect on Toluene Decomposition in a Wire-plate Dielectric Barrier Discharge Reactor
By Yu-fang Guo,Dai-qi Ye,Ya-feng Tian,Ke-fu Chen in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.Modification of Hexatriacontane by O2–N2 Microwave Post-Discharges
By Hody V.,Belmonte T.,Pintassilgo C.,Poncin-Epaillard F.,Czerwiec T.,Henrion G.,Segui Y.,Loureiro J. in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.Preparation and Application of Ca0.8 Sr0.2 TiO3 for Plasma Activation of CO2
By Li Ruixing,Tang Qing,Yin Shu,Sato Tsugio in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.Spectroscopic Analysis of a Pulsed-Laser Deposition System for Fullerene-like Cn
By Riascos H.,Zambrano G.,Prieto P. in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.Modelling of Carbon Tetrachloride Decomposition in Oxidative RF Thermal Plasma
By Kovács Tamás,Turányi Tamás,Főglein Katalin,Szépvölgyi János in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.By Sonnenfeld Axel,von Sonnenfeld Philipp,Hauert Roland in (2006)
Plasma Chemistry and Plasma Processing,volume 26,issue 3 , Vol. 26, Iss. 3, 2006-06 , pp.