Author: Sophonvachiraporn Pannee Rujiravanit Ratana Sreethawong Thammanoon Tokura Seiichi Chavadej Sumaeth
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.31, Iss.1, 2011-02, pp. : 233-249
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Abstract
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